AISI 420 steel samples were subjected to three heat treatment conditions: annealed, hardened, and tempered at 400°C, followed by low-temperature nitriding using N2, H2, and varying Ar proportions in a pulsed DC glow discharge. The study aimed to investigate the impact of varying Ar content (10–50 vol.%) on glow discharge characteristics and surface properties of nitrided samples, using an 80% N2 + 20% H2 base gas mixture. The samples underwent characterization including optical microscopy, X-ray diffractometry, microhardness, and roughness measurements. Plasma characterization was conducted using optical emission spectroscopy. The results indicated that higher Ar concentrations led to increased thickness of the nitrided layer (up to 67%), as well as hardness (up to 14%) and surface roughness (up to 50%). These improvements stemmed from increased Ar-based species bombardment on the surface, enhancing the cleaning effect of surface oxides. This facilitated nitrogen adsorption onto the steel surface, increasing the atomic nitrogen concentration in the outermost layer of the steel. The increased nitrogen concentration facilitated diffusion, resulting in significant physical-chemical reactions at the surface-plasma interface. These reactions, including sputtering, molecule dissociation, and recombination, led to enhanced high-diffusivity pathways within the martensitic microstructures of both the as-hardened and 400°C-tempered samples. 42 conditions annealed hardened 400C C 400 400°C lowtemperature low temperature N H 10–50 1050 10 50 (10–5 vol.% vol 80 20 mixture microscopy Xray X ray diffractometry microhardness measurements spectroscopy up 67%, 67 67% , 67%) 14% 14 50%. 50% . 50%) Arbased based oxides diffusion physicalchemical physical chemical surfaceplasma plasma interface sputtering dissociation recombination highdiffusivity high diffusivity ashardened 400°Ctempered 400Ctempered Ctempered 4 40 10–5 105 1 5 (10– vol. 8 2 6 10– (10 (1 (

Recent studies have demonstrated mechanical, tribological and corrosion improvements properties on raw materials coated with stainless steel films produced by magnetron sputtering. However, few studies have reported the tribological behavior of thin austenitic stainless-steel films applied to the surface of carbon steels. The present study investigated the tribological behavior of AISI 1045 carbon steel coated with AISI 316 stainless steel film. Pin-on-disc dry sliding wear test was performed. The wear tracks were analyzed using a scanning electron and confocal microscopes. The corrosion resistance of coated and uncoated AISI 1045 were also assessed through an electrochemical test. Samples which presented a mixture of α-Ferrite and γ-iron, with predominant austenite parts, demonstrated lower friction coefficient, lower wear rates, and better corrosion resistance compared to substrate material. The results were also influenced by the variables used in the deposition process, as observed, heating the substrate and submitting to a higher powder density could improve the results. The results found corroborate to the academic and industrial research which looks for coating alternatives to AISI 1045 tools. mechanical sputtering However stainlesssteel steels 104 31 film Pinondisc Pin disc performed microscopes αFerrite α Ferrite γiron, γiron γ iron, iron γ-iron parts coefficient rates material process observed tools 10 3 1

Nowadays, few studies have reported on the sensitivity of thin films of Al-doped ZnO to ozone. This gas can become harmful to health depending on its environmental concentration. This work presents the sensor response to ozone gas of pure ZnO and Al-doped thin films, prepared by sputtering with varying deposition times. Ceramic targets prepared by SSR, compacted at 65MPa, sintered at 950°C, with densities ranging from 74-97% of the theoretical density, depending on the dopant content were used. The films showed an increase in thickness with deposition time and a preferential growth in the (002) plane of the ZnO structure. Slight changes in the band gap value occurred with increasing Al, whose presence in the ZnO lattice was confirmed by XPS. The sensitivity results to ozone showed that the performance of the films decreased with the Al-doping, which could be attributed to the defects formation related to oxygen in the lattice during Zn-Al substitution or to the greater densification of the films. Although the results showed a decrease in the sensor properties, all films are sensitive to ozone, including the low concentrations of 50 ppb, a limit considered for a maximum daily average for human exposure, established by the WHO. Nowadays Aldoped Al doped concentration times SSR 65MPa MPa 950C C 950 950°C 7497% 7497 74 97% 97 74-97 density used 002 (002 structure XPS Aldoping, Aldoping doping, doping Al-doping ZnAl Zn properties 5 ppb exposure WHO 95 749 7 9 74-9 00 (00 74- 0 (0 (

Abstract The quality of thin films is the key to any improvement made in the manufacturing of device components. Therefore, the method of obtaining this quality based on the deposition parameters is the focus of our group. The influence of temperature and high pressure on the number of ejected particles, and therefore their deposition and formation of the finest thin films, is investigated in this paper using the sputtering technique in the context of the Monte-Carlo approximation. First, a vacuum chamber with a dimension of 30 × 30 × 50 cm, holding a magnetron with a circular target with a radius of 2 cm, was created. Then, inside this chamber, 105 particles of argon (Ar) were followed by the same amount of xenon (Xe) gas we injected. This target moves 8 cm away from the substrate (with a radius of 7 cm), containing three materials (silicon (Si), germanium (Ge), and copper (Cu)) widely used in advanced technologies such as electronics and photovoltaic cell panels. The obtained results demonstrate that increasing the pressure (0.5, 2, and 5 Pa)for both gases dropped off spectacularly the total number (with different values) of the material particles reaching the substrate and disrupting the morphology of thin films. Moreover, in contrast to pressure, it has also been proven that mounting gas temperatures of 100, 300, and 600 K, representing three different states in Kelvin degrees, where 100 K ≈ -173o C for the low (cold), 300 K ≈ 27o C for the regular (atmospheric), and 600 K ≈ 327o C for the high (warm) instances, supply a large number of material atoms at the substrate level. In addition, silicon yielded the best results compared to germanium and copper.

ABSTRACT Introduction: Surface treatment is an important technique to increase adhesion between implants and bones, improving its mechanical characteristics and consequently the patient’s comfort. Objectives: Ni-Cr alloys were the object of study in this work, with the purpose of analyzing and evaluating the effect of thin films deposition of titanium nitride via plasma, on its surface and comparing with cathodic cage (CC) and hollow cathode (HC) methods, for dental applications. Methods: Eighteen samples were prepared and the experiment was conducted in two steps: the pre-sputtering (1h, 350 °C, gases: Ar and H) and sputtering (4h, 450 °C, gases: Ar, Ni, and H). To characterize and compare the samples with those of reference, the Scanning Electron Microscopy (SEM), X-Ray Diffraction (XRD), Vickers Microhardness and wettability tests were used. Results: The results presented by SEM showed that during the surface treatment using CC, voids were formed, and using HC, the samples showed a more homogenous behavior. In microhardness tests, using a 25gf load, it was possible to observe that the HC method allowed an increase of 87% when compared to the reference and treated samples. Significance: Lastly, it can be concluded that both methods are suitable for Ni-Cr alloy surface treatment, and the HC technique, a method already used by dental professionals, presents better results due to the formation of a thicker film layer. Introduction bones patients patient s comfort Objectives NiCr Ni Cr work plasma CC (CC (HC applications Methods steps presputtering pre 1h, 1h h (1h 35 C °C gases H 4h, 4h (4h 45 H. . SEM, , (SEM) XRay X Ray XRD, XRD (XRD) Results formed behavior gf load 87 Significance Lastly professionals layer 3 4 (SEM (XRD 8

ABSTRACT Currently, the presence of spurious microwave radiation is increasing in the environment, which has caused concern due to possible health problems in living beings and electromagnetic interference in electronic systems. To control this problem, studies in the materials area are taking place, aiming to attenuate the spurious radiation and meet requirements of good performance in broadband, low cost and low weight. The present work aimed to study Cu and Ni nanometric films with thicknesses of 65 and 200 nm, deposited on polyethylene terephthalate substrate by magnetron sputtering. Scanning electron microscopy with a field emission gun (FEG-SEM) showed that the films produced have different morphological textures, due to the parameters used in the sputtering process and also the free energy of metals. Impedance spectroscopy measurements showed that the films have low conductivity values, due to the metallic oxides formed on the film surfaces, confirmed by X-ray diffraction, and also to the presence of defects. Electromagnetic characterization (8.2 – 12.4 GHz) showed that the Cu and Ni thin films had low performance, except the Ni_200 nm film, which showed a total shielding efficiency of about 30% in broadband. This result is promising considering the nanometric thickness of the Ni film. Currently environment systems problem place broadband weight 6 20 FEGSEM FEG SEM (FEG-SEM textures metals values surfaces Xray X ray diffraction defects 8.2 82 8 2 (8. 124 12 4 12. GHz Ni200 Ni_20 30 8. (8 1 Ni20 Ni_2 3 ( Ni2 Ni_

Thin films of titanium aluminum nitride (Ti(1-x)AlxN) were deposited on silicon, copper, and plasma nitrided AISI D2 tool steel substrates through reactive direct current grid-assisted magnetron sputtering. The depositions were performed in the metal and compound modes using nitrogen flow rates of (7.2 ± 0.1) sccm and (6.8 ± 0.2) sccm, respectively. The relations between the process parameters and the crystallographic orientation were investigated. Chemical and mechanical properties were characterized by X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM), and instrumented indentation technique (IIT). X-ray diffraction spectra and electron diffraction patterns revealed the presence of a Ti(1-x)AlxN phase with a face-centered cubic structure in both films. In metal mode, the coatings exhibited a preferential (111) plane orientation, changing to (200) in the compound mode. The change in preferential orientation was influenced by the reactive gas partial pressure. Ti1xAlxN TixAlxN Ti 1 x AlxN (Ti(1-x)AlxN silicon copper D gridassisted grid assisted sputtering 7.2 72 7 2 (7. 0.1 01 0 6.8 68 6 8 (6. 0.2 02 respectively investigated Xray X ray XPS, XPS , (XPS) XRD, XRD (XRD) SEM, SEM (SEM) TEM, TEM (TEM) IIT. IIT . (IIT) facecentered face centered mode 111 (111 200 (200 pressure xAlxN 7. (7 0. 6. (6 (XPS (XRD (SEM (TEM (IIT 11 (11 20 (20 ( (1 (2

The aerospace industry is constantly looking for innovative materials that exhibit good mechanical and corrosion properties. The 2198-T851 (Al-Cu-Li) alloy was developed to replace the conventional Al-Cu-Mg in aircraft structures. Despite the usefulness of the 2198-T851 alloy, its performance may be affected when subjected to an aggressive medium containing chloride ions. The deposition of Nb2O5 coatings by using the reactive sputtering technique on the 2198-T851 alloy surface appears as a powerful tool to improve the corrosion resistance of this material. Recently, groundbreaking research findings have demonstrated the positive effect of Nb2O5 coatings on corrosion protection of alloy 2198-T851. However, the corrosion products originated from the 2198-T851 aluminium alloy are poorly understood. The use of Raman spectroscopy and XPS techniques may help to shed some light on the corrosion products of 2198-T851 alloy. Results demonstrated the corrosion products are mainly composed by CuCl2 x H2O, CuCl, Cu2Cl(OH)3, Al(OH)3, and AlO(OH). properties 2198T851 T 2198 T851 2198-T85 AlCuLi Al Cu Li (Al-Cu-Li AlCuMg Mg structures ions NbO Nb O Nb2O material Recently 2198T851. T851. However understood CuCl H2O HO H Cu2ClOH3, Cu2ClOH3 CuClOH Cu2Cl OH 3, 3 Cl Cu2Cl(OH)3 AlOH3, AlOH3 AlOH Al(OH)3 AlOOH. AlOOH AlO . AlO(OH) 2198T85 219 T85 2198-T8 ClOH Cu2ClOH Cu2Cl(OH) Al(OH) AlO(OH 2198T8 21 T8 2198-T Cu2Cl(OH Al(OH 2198T 2

The present paper sets out to investigate the role of voltage pulse length on the properties of Nb:TiO2 films deposited by High Power Impulse Magnetron Sputtering (HiPIMS). Several characteristics of the films were investigated, namely, resistivity, transmittance, crystallinity and band gap values of Nb:TiO2 films. Reactive depositions were carried out in Ar/O2 plasma with 40 µs, 50 µs, 60 µs, and 70 µs pulses. Increasing the pulse length changes the deposition from compound to metal mode. As it gets closer to metal mode, the deposition rate increases by up to one order of magnitude, while the resistivity of the resulting Nb:TiO2 film becomes as low as 10-4 Ω.cm, without any significant loss in optical transmittance, which remains close to 90% for a wavelength around 450 nm, but reduction in 25% of heat transmission (above 800 nm) were observed. Results indicate the anatase phase for all deposition conditions, and Ti3+ states increase with the pulse length, which can be explained by the generation of a second band gap. Both the niobium doping and the Ti3+ states can contribute to increase the conductivity of the Nb:TiO2 films in the as-deposited condition. NbTiO2 NbTiO Nb TiO2 TiO Nb:TiO HiPIMS. HiPIMS . (HiPIMS) investigated namely transmittance ArO2 ArO Ar O2 O Ar/O 4 5 6 7 pulses mode magnitude 104 10 10- Ωcm Ω cm Ω.cm 90 45 nm 25 above 80 observed conditions Ti3 Ti asdeposited condition (HiPIMS 1 9 2 8

ABSTRACT The basic aim of this in vitro study was to investigate the effects of different silver deposition times on the two-body wear, antibacterial and cytotoxicity properties of silver ions on Ti15Mo alloy. The direct current (DC) magnetron sputtering technique was used to create silver films at different times (30, 45 and 60 minutes); the experimental setup was predetermined. The phase structures, cross-sectional morphology, surface roughness, two-body wear behavior, antibacterial and cytotoxicity properties of all specimens were researched in detail. The surfaces of all films showed a homogeneous distribution. It was observed that silver films enhanced the two-body wear resistance of Ti15Mo alloys. Furthermore, significant correlations were discovered between hardness, surface roughness and wear volume loss. Compared to Ti15Mo alloys, the antibacterial and cytotoxicity test results showed that silver films deposited 30 and 45 min had superior antibacterial and biocompatibility properties. twobody two body TiMo Ti Mo alloy DC (DC 30, (30 4 6 minutes minutes) predetermined structures crosssectional cross sectional morphology behavior detail distribution alloys Furthermore hardness loss 3 (3 (

Abstract When ice forms on solid surfaces, it can cause issues in many different sectors (aircraft, electricity lines, etc.). Surfaces and coatings with hydrophobic qualities may be used in anti-icing applications. The purpose of this work is to utilize RF Magneton Sputtering to deposit AZO thin coatings, which will slow the accumulation of ice on the surface. The effects of changes in argon partial pressure on the anti-icing, wettability, optical, and structural properties of the resulting thin films have been experimentally investigated. X-ray diffraction demonstrated a (002) peak of ZnO, the intensity of the peak diminishes with an increase in partial pressure. The band gap was measured to be between 2.98 and 3.15 eV, and the average maximum transmittance was observed to be around 82% for 50% partial pressure and 71% for 33% partial pressure, confirming the transparency of the thin films. Wettability studies revealed that the films are hydrophobic with a maximum contact angle of 127.5°, which was deposited at lower partial pressure. Films deposited at 33% partial pressure delayed the formation of ice on the surface by 4.5 folds when compared to an uncoated substrate. surfaces aircraft, aircraft (aircraft lines etc.. etc etc. . etc.) antiicing anti icing applications antiicing, icing, wettability optical investigated Xray X ray 002 (002 ZnO 298 2 98 2.9 315 3 15 3.1 eV 82 50 71 33 1275 127 5 127.5° 45 4 4. substrate 00 (00 29 9 2. 31 1 3. 8 7 12 127.5 0 (0 127. (

In this work, thin films based on the Ti-Zr system were studied, deposited on a silicon substrate by the magnetron sputtering technique using simultaneously a combination of High-Power Impulse Magnetron Sputtering (HiPIMS) and Direct Current Magnetron Sputtering (DCMS) sources. The objective of this work is analyzing the effect of varying HiPIMS frequency (300 Hz, 400 Hz, 500 Hz, and 600 Hz) on the characteristics and properties of the thin films. The thickness increased between 300 Hz and 500 Hz, where the thickness measured 563 nm and 732 nm, respectively; then it decreased to 709 nm at 600 Hz. Hardness and elastic moduli also tended to decrease with increasing frequency, and the results for the first property were between 7 GPa and 10.3 Gpa, while the elastic moduli were from 114 Gpa to 157 Gpa, in which lower values were reached at higher frequencies. In the wettability test, lower contact angles were observed for samples with lower frequencies due to their high surface energy, providing better hydrophilic properties. TiZr Ti Zr studied HighPower High Power (HiPIMS DCMS (DCMS sources (30 40 50 60 30 56 73 respectively 70 103 10 3 10. 11 15 test energy (3 4 5 6 1 (

This work reports on the properties of GaN films grown by reactive magnetron sputtering onto glass substrate kept at relatively low temperature (400°C), using different RF power applied to the Ga target. Their structural, morphological, vibrational and optical properties were characterized by X-ray diffraction, atomic force and scanning electron microscopies, Raman spectroscopy and UV-vis spectrophotometry. The films have wurtzite phase with strong preferential orientation in the c-axis direction. Moreover, two clear contributions to the (0002) diffraction peak could be found, indicating the presence of two different morphologies, which were discussed in terms of the formation of an intermediate layer between the substrate and a dominating columnar-like microstructured film. 400°C, 400C C 400°C , 400 (400°C) target structural morphological Xray X ray microscopies UVvis UV vis spectrophotometry caxis c axis direction Moreover 0002 (0002 found morphologies columnarlike columnar like film 40 (400°C 000 (000 4 00 (00 0 (0 (

Biomedical engineering has been constantly looking for the development of new materials that have bioactive surfaces and that are responsible for new bone formation, induce osteoblast differentiation and present antibacterial properties. Here, we present innovative and applied research to evaluate the influence of niobium pentoxide thin films (Nb2O5) deposited on the surface of a Ti-6Al-4V alloy via the reactive sputtering technique on antibacterial activity, on the cellular proliferation of MC3T3 cells and on biomineralization capacity. Results demonstrated the reactive sputtering technique improved the cell viability, the osteogenic performance of cells involved in the osseointegration process, the ability to delay bacterial proliferation within the first six hours of contact with S. aureus as well as the capacity to promote rapid amorphous apatite formation in vitro. These findings confirm the great potential of the Ti-6Al-4V alloy functionalized with Nb2O5 for future applications in implantable devices. properties Here NbO Nb O (Nb2O5 Ti6Al4V TiAlV Ti 6Al 4V Al V activity MCT MC T MC3T viability process S vitro Nb2O devices (Nb2O

We investigate the structural, optical, thermal-optical, and electronic properties of TiNx thin films utilizing a variety of experimental techniques, including spectroscopic ellipsometry, Raman spectroscopy, scanning electron microscopy, atomic force microscopy, thermal lens spectroscopy, and UV-VIS spectroscopy. Our experimental results indicate a remarkable metallic character in the TiNx thin films deposited under lower N2 flow during treatment, as well as an increase in reflectance in the infrared region and thermal diffusivity as the partial N2 flow is reduced, which is consistent with previous experimental studies. The microscopic origin of these trends is explained in terms of the atomic structure of the system, where Ti atoms contribute free carriers that interact with IR radiation and N atoms create imperfections in the lattice, causing greater scattering of phonons, respectively. The experimental results also indicate that the roughness of the films produced with a lower N2 partial flow was lower than that of the films with a higher N2 partial flow. To explain the deviation of optical properties from the ideal case, surface oxidation is also investigated. This facilitates the coating of smarting windows with TiNx thin films. structural thermaloptical, thermaloptical thermal-optical techniques ellipsometry spectroscopy microscopy UVVIS UV VIS treatment reduced studies system lattice phonons respectively case investigated