The mild anodization (MA) reactor is exemplified for its operational simplicity and its excellent control over the experimental parameters that are involved in the anodization process. This method provides porous anodic alumina films with a regular cell-arrangement structure. This offers a better cost-benefit ratio than the other equipment configurations that are used to fabricate nanoporous structures (i.e., ion beam lithography). Conversely, the hard anodization (HA) reactor produces oxides at a rate that is 25 to 35 times faster than the MA reactor. The produced oxides also have greater layer thicknesses and interpore distance, and with a uniform nanopore spatial order (> 1000). In contrast to MA reactors, the construction of an HA reactor requires special components to maintain anodisation at a high potential regime. Herein, we describe and compare both reactors from a technical viewpoint.

In this technical note, we describe the construction of a low-cost computer controlled device for layer-by-layer film fabrication. The software allows to control multiple material deposition, washing and drying steps and the time for each operation. To test the device, we produced and characterized self-assembled films of conductive polymers by alternating poly(o-methoxyaniline) (POMA) and poly(3-thiophene acetic acid) (PTAA) via the layer-by-layer technique.