The aim of this work was to study the influence of varying nitrogen potential during plasma nitriding of stainless steel ISO 5832-1. The control of nitrogen potential was achieved by pulsing the nitrogen flow for different times (01/19, 02/18, and 05/15), where the numbers represent the time (in minutes) of nitrogen flow on/off, thus creating an intermittent flow of nitrogen during the treatment. For all tested conditions - continuous and pulsed flow of nitrogen - the treatment temperature was kept at 425ºC during 2 and 8 hours. Specimens were characterized by means of X-ray diffraction, scanning electron microscopy, optical microscopy, energy-dispersive X-ray spectroscopy, and nanohardness. Results showed that the layer thickness increases with the increase of total treatment time, and decreased for shorter times of pulsed nitrogen flow. Smaller expansion of the austenite phase, as well as less precipitation of chromium nitrides, were also observed for shorter times of pulsed nitrogen flow. Hence, the use of intermittent nitrogen flow appears to be an efficient approach in order to control the nitrogen concentration within the layer, reducing its brittleness.

RESUMO Corpos de prova de aço inoxidável austenítico ISO 5832-1(similar ao AISI 316L, para aplicações biomédicas) apresentando camada superficial enrriquecida em nitrogênio (fase S), obtidos pelos processos de nitretação por plasma em baixa temperatura e SHTPN (Solution Heat Treatment after Plasma Nitriding -Tratamento de solubilização após nitretação por plasma), além de amostras não tratadas, foram testadas em ensaio de desgaste microabrasivo do tipo esfera livre. Os resultados mostraram que as superfícies nitretadas por plasma em baixa temperatura apresentam o menor coeficiente de desgaste para menores tempos de ensaio. No entanto, devido à pequena espessura de camada nitretada, com o aumento do tempo de ensaio as amostras processadas via SHTPN passam a apresentar desempenho superior, indicando que, dependendo das solicitações de desgaste, um ou outro processo apresenta o melhor desempenho.

ABSTRACT Samples of the ISO 5832-1 austenitic stainless steel (similar to AISI 316L for biomedical applications) with nitrogen-rich surface layer (S-phase), obtained by plasma nitriding at low temperature and SHTPN (Solution Heat Treatment after Plasma Nitriding) processes, as well as non-treated samples, were tested to evaluate its micro-abrasive wear behavior. The micro-abrasive wear test were performed using the free-ball configuration. The results pointed out that the nitrided surfaces present lower wear coeficient for short measuring time. Nevertheless, since nitrided layers are relatively thin, for prolongated wear tests the SHTPN samples presented lower wear cofiecient, indicating that depending on the apllication one of the processes will present the best behaviour.

ABSTRACT Plasma surface cleaning is an alternative process that aims at the fully removal of organic contaminants on several kinds of materials. Despite its advantages, there are still lacks on the comprehension of the complex relations between plasma-generated species and organic molecules during plasma cleaning. In the present work, a linear alkane (hexatriacontane - C36H74), used as a contaminant model, was exposed to an Argon radiofrequency (RF) inductively coupled plasma (ICP). The by-products from degradation were monitored by optical emission spectroscopy (OES) and residual gas analysis (RGA), to identify the influence of sample positioning on E and H discharge modes regions. The exposition to H-mode discharge resulted in more intense and profuse emissions of C-H and C2 systems. RGA results show similar byproducts from degradation in both modes; however, the intensity from treatment in H-mode is largely greater. It was also observed that plasma etching in H-mode is enough to melt the sample, while E-type discharge leaves the surface of the sample apparently unchanged.

In this work, stearic acid (SA) was degraded in an Ar-O2and Ar-H2post-discharge environment created by a plasma reactor with a microwave source and in an Ar, Ar-H2and Ar-O2DC (Direct Current) discharge environment created in a cathode-anode confined system. The afterglow region is useful for understanding the role of the chemically active species (O, O2, H and H2). In contrast, the discharge region allows the observation of the effects of chemically active species, charged species (ions and electrons) and photons. The influence of these species on the grafting and etching of SA was evaluated by measuring the mass variation, mass variation rate and chemical composition. The results showed that when only chemically active oxygen species are present, the SA is preferentially grafted. However, when both photons and charged species are present, the SA is more efficiently etched. When the Ar-H2and Ar environments are utilized; the SA is not efficiently degraded.